Patterning at ion-beam sputtering

Stationary surface structures formation during ion beam sputtering

The formation of stationary surface structures during ion sputtering of materials was discussed. We generalize anisotropic Bradley-Harper model and study the behavior of the system described by the stochastic Kuramoto-Sivashinsky equation with multiplicative noise caused by fluctuations in the incidence. The dynamics of the stationary surface structures formation depending on the basic system parameters reduced to the angle of incidence and the properties of the target (the penetration depth of the ion into the target) was considered. We discussed growth and roughness exponents of the sputtered surface and the dynamics of the structural defects. An influence of the internal multiplicative noise intensity on the system dynamics is studied.

I.O. Lysenko, V.O. Kharchenko, S.V. Kokhan, A.V. Dvornichenko Stationary surface structures formation during ion beam sputtering, Metallofiz. Noveishie Tekhnol. V.35, ¹ 6, p.763 (2013)

Modeling of patterning at the surface during ion-beam sputtering

We study pattern formation processes in anisotropic system governed by the Kuramoto-Sivashinsky equation with multiplicative noise as a generalization of the Bradley-Harper model for ripple formation induced by ion bombardment. For both linear and nonlinear systems we study noise induced effects at ripple formation and discuss scaling behavior of the surface growth and roughness characteristics. It was found that the secondary parameters of the ion beam (beam profile and variations of an incidence angle) can crucially change the topology of patterns and the corresponding dynamics.

V.O.Kharchenko, D.O.Kharchenko, I.O.Lysenko. Modeling of ion-beam induced nano-size surface patterns in anisotropic systems. Nanotechnology Vol. 2: Synthesis and Characterization, Chapter 13, ed. by J.N.Govil, (Studium Press LLC, Houston, USA 2012) p.367.

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